Products
The solver comprises fast algorithms for unlimited 1D & 2D multi-layer gratings in classical & conical mount based on RCWA, C-method and Rayleigh-Fourier method. Moreover, roughness & irregularity modeling in preparation (please contact if interested).
 
Nearfield Simulation of a metallic grating
Multilayer Stack by Unigit
Scatterometry Software
NEW: LER & LWR Modeling
 
L/S grating with LER
Diffracted (strong peaks) and scattered light in the reflection hemisphere (s- & p-polarisation)
1. Standard Ellipsometric and Reflectometric Scatterometry
 
Simulation vs. Measurement for a photoresist L/S grating on BARC/Si at 70.6° incidence.
2. Mueller Ellipsometry & Scatterometry/p>
Mueller Ellipsometry for Sub-Micro Patterns - Simulation vs. Measurement for a photoresist L/S grating on BARC/Si.
All measurements have been done by Sentech Instruments/ Berlin/ Germany.
Photolithography Simulation Software
Cross Section of a EUV-Mask with a defect beneath the multi-layer stack.
Modeled aerial image for the EUV mask of the previous picture with the lateral offset of the defect relative to the absorber as a parameter. | 
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